Actinic inspection, pellicle monitoring, and die-to-database verification drive demand as foundries enforce full reticle coverage and native-wavelength defect detection NEWARK, DE / ACCESS Newswire / ...

The eBeam Initiative’s 11th annual Luminaries survey in 2022 reported EUV fueling growth of the semiconductor photomask industry while a panel of experts cited a number of complications in moving to ...

Leading‑edge system-on-chip (SoC) designs at deep submicron nodes are stretching lithography and patterning capabilities across the entire manufacturing flow. Extreme ultraviolet (EUV) lithography has ...

At last month's SPIE Advanced Lithography + Patterning Conference, Belgian electronics research center imec presented the latest results from its Joint High-NA Lab and the patterning ecosystem around ...

PLAINVIEW, N.Y., Feb. 10, 2022 (GLOBE NEWSWIRE) -- Veeco Instruments Inc. (NASDAQ: VECO) today announced that a mask blank supplier to the semiconductor industry has ordered Veeco’s IBD-LDD® Ion Beam ...

TOKYO, Sept. 09, 2025 (GLOBE NEWSWIRE) -- Leading semiconductor test equipment supplier Advantest Corporation (TSE: 6857) today announced the release of its next-generation CD-SEM* E3660, engineered ...

Belgium-based semiconductor research institute Imec will present its latest achievements that enable high-numerical aperture (High-NA) extreme ultraviolet (EUV) lithography at the 2024 Advanced ...

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...

Lasertec, the sole provider of EUV patterned mask inspection systems, aims for double-digit revenue growth despite a slowdown in sales from China due to US export restrictions. The company has also ...

EUV Tech (EUVT), a global leader in manufacturing at-wavelength EUV metrology equipment, is excited to announce the next generation of EUV zoneplate microscopy. The AIRES ® (Actinic Image REview ...

Motorola Inc. today said its researchers have fabricated the first extreme ultra violet (EUV) photomasks for manufacturing sub-micron ICs with feature sizes below 100nm. The photomasks were built with ...

Although Hoya is widely known as an eyeglass lens and contact lens provider, it has more than 60% market share in mask blanks for semiconductor manufacturing, and an even higher market share, at more ...